종합 카달로그-영문

Ion accelerating voltage 2 to 8kV Milling speed 1,000um/h (at 8kV on Si wafer) Sample stage swing angle ±35° Maximum sample size 20(W) × 10(L) × 5.5(T)mm 16(W) × 10(D) × 9.5(H)mm Specimen movement range X axis movement : 士3.5mm Y axis movement : 士2mm Flat milling stage tilt angle range 10° to 90° Sample size for flat milling Ø32 × 18(H)mm Operation 7 inch touch panel Digital microscope for sample positioning Mag. 5x, 10x, 20x, 40x Chamber camera for monitoring Mag. 5x, 10x, 20x, 40x Brightness adjustable in 4 steps Ion beam observation mode (LED off) Gas used Argon gas (99.999%) Gas pressure 0.03MPa ~ 0.05MPa Gas flow control Mass Flow Control unit Vacuum systems Turbo pump, Diaphragm pump Dimension 640(W) × 492(D) × 282(465)(H)mm Weight Main system 45kg / Diaphragm pump 6.5kg Options Air-protection module, Cooling module, Flat milling Specifications 18 19 www.coxem.com